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Thermodynamics of the Si-O-N system. 2: Stability of Si{sub 2}N{sub 2}O(s) by high-temperature mass spectrometric vaporization

Journal Article · · Journal of the American Ceramic Society
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  1. E.N.S.E.E.G., Saint Martin d`Heres (France). Lab. de Thermodynamique et Physico-Chimie Metallurgiques
The Si{sub 2}N{sub 2}O(s) compound is vaporized in a multiple Knudsen-cell connected to a mass spectrometer. Comparison of SiO(g) and N{sub 2}(g) pressures between different samples in the Si-N-O system, as triphasic or diphasic mixtures from Si(s), Si{sub 3}N{sub 4}(s), and Si{sub 2}N{sub 2}O(s), allows the determination of the SiO(g) evaporation coefficient and consequently the calculation of the equilibrium pressure of SiO(g). Then the standard enthalpy of formation of Si{sub 2}N{sub 2}O(s) is determined: {Delta}{sub f}H{sub m}{degree}(Si{sub 2}N{sub 2}O, s, 298.15K) = {minus}887.5 {+-} 10 kJ{center_dot}mol{sup {minus}1}.
Sponsoring Organization:
USDOE
OSTI ID:
253574
Journal Information:
Journal of the American Ceramic Society, Journal Name: Journal of the American Ceramic Society Journal Issue: 5 Vol. 79; ISSN 0002-7820; ISSN JACTAW
Country of Publication:
United States
Language:
English