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Title: The effect of oxygen in the Si substrate on Mo, W, Ti, and Co silicide growth by infrared laser heating

Journal Article · · Journal of the Electrochemical Society; (USA)
DOI:https://doi.org/10.1149/1.2086998· OSTI ID:6504418
;  [1]
  1. School of Electrical Engineering, Cornell Univ., Ithaca, NY (US)

This study of the effect of implanted oxygen in the Si substrate was accomplished using an IR heating method and a combination of different materials analysis techniques. Principally, Auger electron spectroscopy combined with depth profiling was implemented to investigate the composition of the reacted metal-Si systems as well as the relative movement of the oxygen during silicide formation. The authors systematic study of these four metal-Si systems yielded some interesting results. First, for the three metals Mo, W, and Ti, we observed basically inhibited metal-Si reactions at laser processing conditions that yielded completely reacted metal silicides without implanted oxygen. Second, the evolution from inhibited reactions through partial, metal-rich silicides and finally to completely reacted metal silicide formation at high temperatures was observed and characterized. Last, a distinctly response to the presence of oxygen was observed for the Ti samples as compared to the Mo and W samples.

OSTI ID:
6504418
Journal Information:
Journal of the Electrochemical Society; (USA), Vol. 137:8; ISSN 0013-4651
Country of Publication:
United States
Language:
English

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