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An integration of all refractory josephson logic LSI circuit

Conference · · IEEE Trans. Magn.; (United States)
OSTI ID:6485825
An integration process for the fabrication of an all refractory Josephson LSI logic circuit is described. In this process, niobium nitride and niobium double-layered Josephson junctions were integrated using a reactive ion etching with a 2.5 ..mu..m minimum feature. A highly selective and anisotropic RIE process and a planarizing technology have been developed for intagrating a circuit with LSI complexity. For evaluating the process capability, test vehicle circuits with MSI/LSI level complexity have been designed and fabricated using this process. An 8 bit ripple carry adder and a 4X4 bit parallel multiplier have been integrated with Josephson four junction logic ( 4JL ) gates, the largest of which contains more than 2800 Josephson junctions. Both functionality and highspeed performance testings have been successfully performed with these test circuits.
Research Organization:
Electrotechnical Laboratory, Sakura-mura, Niihari-gun, Ibaraki
OSTI ID:
6485825
Report Number(s):
CONF-840937-
Conference Information:
Journal Name: IEEE Trans. Magn.; (United States) Journal Volume: MAG-21:2
Country of Publication:
United States
Language:
English

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