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Gas phase reaction of UF/sub 6/ with SiH/sub 4/

Technical Report ·
DOI:https://doi.org/10.2172/6485813· OSTI ID:6485813
The gas phase thermal reaction of UF/sub 6/ with SiH/sub 4/ begins at approx. 135/sup 0/C producing fluorosilanes, predominantly SiH/sub 3/F, as volatile products along with some nonvolatile black solids. Both unreacted SiH/sub 4/ and UF/sub 6/ were present with SiH/sub 3/F after 25 min at 145/sup 0/C.
Research Organization:
California Univ., Livermore (USA). Lawrence Livermore Lab.
DOE Contract Number:
W-7405-ENG-48
OSTI ID:
6485813
Report Number(s):
UCID-17969
Country of Publication:
United States
Language:
English

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Related Subjects

38 RADIATION CHEMISTRY, RADIOCHEMISTRY, AND NUCLEAR CHEMISTRY
400702* -- Radiochemistry & Nuclear Chemistry-- Properties of Radioactive Materials
ACTINIDE COMPOUNDS
ACTIVATION ENERGY
CHEMICAL REACTIONS
ENERGY
FLUIDS
FLUORIDES
FLUORINE COMPOUNDS
GASES
HALIDES
HALOGEN COMPOUNDS
HIGH TEMPERATURE
HYDRIDES
HYDROGEN COMPOUNDS
SILANES
SILICON COMPOUNDS
TEMPERATURE DEPENDENCE
URANIUM COMPOUNDS
URANIUM FLUORIDES
URANIUM HEXAFLUORIDE