TEA CO/sub 2/ laser with a SiC anode

Journal Article · Sun Dec 01 04:00:00 EST 1985 · Rev. Sci. Instrum.; (United States)

DOI:https://doi.org/10.1063/1.1138358· OSTI ID:6484041

Beaupere, D; Helias, G; Bettinger, A

It is demonstrated that the use of a SiC plane anode and a Dumanchin--Farcy type cathode in the TEA CO/sub 2/ laser system yields very uniform glow discharges producing high specific peak power.

• Research Organization: Laboratoires de Marcoussis, Centre de Recherches de la Compagnie Generale d'Electricite, Division Optronique, Route de Nozay, 91460 Marcoussis, France
• OSTI ID: 6484041
• Journal Information: Rev. Sci. Instrum.; (United States), Journal Name: Rev. Sci. Instrum.; (United States) Vol. 56:12; ISSN RSINA
• Country of Publication: United States
• Language: English

Related Subjects

42 ENGINEERING
420300* -- Engineering-- Lasers-- (-1989)
ANODES
CARBIDES
CARBON COMPOUNDS
CARBON DIOXIDE LASERS
CATHODES
DESIGN
ELECTRIC DISCHARGES
ELECTRODES
FABRICATION
GAS LASERS
GLOW DISCHARGES
LASERS
POWER
SILICON CARBIDES
SILICON COMPOUNDS