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Melt dynamics of silicon-on-sapphire during pulsed laser annealing

Journal Article · · Appl. Phys. Lett.; (United States)
DOI:https://doi.org/10.1063/1.93965· OSTI ID:6481042
Transient electrical conductance measurements have been made on 0.45-..mu..m silicon-on-sapphire during pulsed laser annealing with 25-ns ruby irradiation. The photoconductive contribution to the transient current was sufficiently small that the entire melt and resolidification process could be directly observed. The technique yields quantitative measures of melt depths, melting velocities (5--13 m/s), and solidification velocities (2.8--3.3 m/s). Combined with the complementary techniques of time-resolved reflectivity, energy transmission, and calorimetric energy absorption, transient conductance provides a powerful new diagnostic for investigating melt dynamics.
Research Organization:
Department of Material Science, Cornell University, Ithaca, New York 14853
DOE Contract Number:
AC04-76DP00789
OSTI ID:
6481042
Journal Information:
Appl. Phys. Lett.; (United States), Journal Name: Appl. Phys. Lett.; (United States) Vol. 42:5; ISSN APPLA
Country of Publication:
United States
Language:
English