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Low-threshold disorder-defined buried heterostructure strained-layer Al/sub y/Ga/sub 1-//sub y/As-GaAs-In/sub x/Ga/sub 1-//sub x/As quantum well lasers (lambdaapprox. 910 nm)

Journal Article · · Appl. Phys. Lett.; (United States)
DOI:https://doi.org/10.1063/1.100806· OSTI ID:6474956

The stability of strained-layer Al/sub y/ Ga/sub 1-//sub y/As-GaAs-In/sub x/Ga/sub 1-//sub x/ As single quantum well heterostructures against thermal processing is examined using transmission and scanning electron microscopy. A self-aligned impurity-induced layer disordering process employing Si-O diffusion is used to produce buried heterostructure stripe geometry lasers with a pseudomorphic In/sub x/Ga/sub 1-//sub x/ As quantum well active region. The 2-..mu..m-wide stripe laser diodes exhibit high efficiency (etaapprox.41%/facet), low threshold (I/sub th/ = 7 mA), and high output power (P/sub out/ >20 mW/facet).

Research Organization:
Electrical Engineering Research Laboratory, Center for Compound Semiconductor Microelectronics, and Materials Research Laboratory, University of Illinois at Urbana--Champaign, Urbana, Illinois 61801
OSTI ID:
6474956
Journal Information:
Appl. Phys. Lett.; (United States), Journal Name: Appl. Phys. Lett.; (United States) Vol. 54:10; ISSN APPLA
Country of Publication:
United States
Language:
English