Comparison between thermal annealing and ion mixing of alloyed Ni-W films on Si. I

Journal Article · Sun Dec 01 04:00:00 EST 1985 · J. Appl. Phys.; (United States)

DOI:https://doi.org/10.1063/1.335549· OSTI ID:6467013

Pai, C S; Lau, S S; Poker, D B; Hung, L S

The reactions between Ni-W alloys and Si<100> substrates induced by thermal annealing and ion mixing were investigated and compared. Samples were prepared by sputtering of Ni-W alloys, both Ni-rich and W-rich, onto the Si<100> substrates, and followed by either furnace annealing (200--900/sup 0/C) or ion mixing (2 x 10/sup 15/ -- 4 x 10/sup 16/ /sup 86/Kr/sup +/ ions/cm/sup 2/). The reactions were analyzed by Rutherford backscattering and x-ray diffraction (Read camera). In general, thermal annealing and ion mixing lead to similar reactions. Phase separation between Ni and W with Ni silicides formed next to the Si substrate and W silicide formed on the surface was observed for both Ni-rich and W-rich samples under thermal annealing. Phase separation was also observed for Ni-rich samples under ion mixing; however, a Ni-W-Si ternary compound was possibly formed for ion-mixed W-rich samples. These reactions were rationalized in terms of the mobilities of various atoms and the energetics of the systems.

• Research Organization: Department of Electrical Engineering and Computer Sciences, University of California, San Diego, La Jolla, California 92093
• DOE Contract Number: AC05-84OR21400; FG03-84ER45156
• OSTI ID: 6467013
• Journal Information: J. Appl. Phys.; (United States), Journal Name: J. Appl. Phys.; (United States) Vol. 58:11; ISSN JAPIA
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360106* -- Metals &amp; Alloys-- Radiation Effects
ALLOYS
ANNEALING
BACKSCATTERING
BEAMS
CHARGED PARTICLES
CHEMICAL REACTIONS
COLLISIONS
ELEMENTS
FILMS
HEAT TREATMENTS
HIGH TEMPERATURE
INTERFACES
ION BEAMS
ION COLLISIONS
ION IMPLANTATION
IONS
KRYPTON IONS
LAYERS
MEDIUM TEMPERATURE
MIXING
NICKEL ALLOYS
NICKEL COMPOUNDS
NICKEL SILICIDES
PHASE STUDIES
PHYSICAL RADIATION EFFECTS
RADIATION EFFECTS
REFRACTORY METAL COMPOUNDS
SCATTERING
SEMIMETALS
SILICIDES
SILICON
SILICON COMPOUNDS
SYNTHESIS
THIN FILMS
TRANSITION ELEMENT COMPOUNDS
TUNGSTEN ALLOYS
TUNGSTEN COMPOUNDS
TUNGSTEN SILICIDES