Comparison of two new microwave plasma sources for hf chemical lasers

Journal Article · Sun Jan 01 04:00:00 EST 1978 · IEEE J. Quant. Electron.; (United States)

DOI:https://doi.org/10.1109/JQE.1978.1069660· OSTI ID:6424987

Bertrand, L ^[1]; Gagne, J M; Bosisio, R G; Moisan, M

---

1. Ecole Polytechnique, Montreal, Quebec

The performances of two microwave sources used to produce fluorine atoms by dissociation of SF/sub 6/ for a c-w hydrogen fluoride chemical laser are compared. The first device, large microwave plasma (LMP), is a slow-wave structure while, the other (surfatron) excites a plasma surface wave. Their performances, as far as electrical and chemical efficiencies are concerned, are quite similar when operated at the same microwave power level. However, the slow-wave structure can sustain higher microwave power, providing larger laser output power, while the surfatron has much smaller dimensions, allowing for a more compact laser system.

• OSTI ID: 6424987
• Journal Information: IEEE J. Quant. Electron.; (United States), Journal Name: IEEE J. Quant. Electron.; (United States) Vol. QE-14:1; ISSN IEJQA
• Country of Publication: United States
• Language: English

Related Subjects

42 ENGINEERING
420300* -- Engineering-- Lasers-- (-1989)
CHEMICAL LASERS
DISSOCIATION
ELECTROMAGNETIC RADIATION
ELECTRONIC EQUIPMENT
FLUORIDES
FLUORINE COMPOUNDS
HALIDES
HALOGEN COMPOUNDS
HYDROFLUORIC ACID
HYDROGEN COMPOUNDS
INORGANIC ACIDS
LASERS
MICROWAVE EQUIPMENT
MICROWAVE RADIATION
PLASMA
RADIATION SOURCES
RADIATIONS
SULFUR COMPOUNDS
SULFUR FLUORIDES