Atomic-fluorine formation and removal kinetics for sulfur hexafluoride in an HF glow discharge

Journal Article · Tue Mar 01 04:00:00 EST 1988 · High Energy Chem. (Engl. Transl.); (United States)

OSTI ID:6420745

Nevzorov, P I; Slovetskii, D I; Shelykhmanov, E F

Measurements have been made on atomic-fluorine formation and removal in an HF discharge by means of a spectroscopic pulse-relaxation method. The atoms are formed by dissociation from the initial compounds on single collision with electrons, while they are removed by heterogeneous recombination with SF/sub 5/ radicals at the metal electrodes, the reaction being of the first order in the fluorine-atom concentration.

• OSTI ID: 6420745
• Journal Information: High Energy Chem. (Engl. Transl.); (United States), Journal Name: High Energy Chem. (Engl. Transl.); (United States) Vol. 21:5; ISSN HIECA
• Country of Publication: United States
• Language: English

Related Subjects

37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY
400201* -- Chemical & Physicochemical Properties
42 ENGINEERING
420300 -- Engineering-- Lasers-- (-1989)
ATOMIC IONS
CHARGED PARTICLES
CHEMICAL REACTION KINETICS
COLLISIONS
DE-EXCITATION
ELECTRIC DISCHARGES
ELECTRICAL PUMPING
ELECTRON COLLISIONS
ELECTRON-MOLECULE COLLISIONS
ELEMENTS
ENERGY LEVELS
ENERGY-LEVEL TRANSITIONS
EXCITED STATES
FLUORIDES
FLUORINE
FLUORINE COMPOUNDS
FLUORINE IONS
GLOW DISCHARGES
HALIDES
HALOGEN COMPOUNDS
HALOGENS
HIGH-FREQUENCY DISCHARGES
IONIZATION
IONS
KINETICS
LASER MATERIALS
MATERIALS
MATERIALS TESTING
MOLECULE COLLISIONS
NONMETALS
PRODUCTION
PUMPING
REACTION KINETICS
RECOMBINATION
REMOVAL
RESOLUTION
SPATIAL RESOLUTION
SULFUR COMPOUNDS
SULFUR FLUORIDES
TESTING