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Spectroscopic study of chemical composition of high-frequency glow-discharge in halogen-containing gas mixtures

Journal Article · · J. Appl. Spectrosc. (Engl. Transl.); (United States)
OSTI ID:5331485
This paper presents a spectroscopic study of high-frequency (HF) gas discharge in mixtures of fluorine- and chlorine-containing gases: trichlorotrifluoroethane (C/sub 2/F/sub 3/Cl/sub 3/), sulfur hexafluoride (SF/sub 6/), and tetrafluoromethane (CF/sub 4/). The optical emission spectrum of the plasma was recorded in the range of 200-800 nm by the photoelectric method, using an MDR-23 monochromator, FEU-79 and FEU-39A radiation dectectors. A small amount of argon was added to the plasma-forming gas to determine the concentration of atoms and radicals and change in the plasma parameters when the discharge burning regimes are changed. The experiments showed that the most probable molecule emitting the 280-335-nm band with a maximum at lambdamax = 306 nm is si /SUB x/ S /SUB y/ Fz. It can be formed as a result of the interaction of sulfur-fluorine containing radicals with the silicon surface, or in the bulk of the material, due to the reaction of SiF /SUB m/ and SF /SUB n/ radicals.
OSTI ID:
5331485
Journal Information:
J. Appl. Spectrosc. (Engl. Transl.); (United States), Journal Name: J. Appl. Spectrosc. (Engl. Transl.); (United States) Vol. 43:3; ISSN JASYA
Country of Publication:
United States
Language:
English

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