fabrication of niobium-lead tunnel junctions using a self aligned masking technique

Conference · Fri Mar 01 04:00:00 EST 1985 · IEEE Trans. Magn.; (United States)

OSTI ID:6389111

Jain, A K; Lukens, J E; Sauvageau, J E; Schwartz, D B; Springer, K T

The use of suspended stencils in the self aligned fabrication of niobium lead tunnel junctions has been investigated. It is shown that while all-polymer masks are unsatisfactory for this application, suspended aluminum stencils supported on polyimide can be used to make these junctions with good current-voltage characteristics. This stencil, which can be baked to at least 200/sup 0/C, is made using e-beam lithography, lift off and plasma etching in oxygen. With this technique, junctions with submicron dimensions have been fabricated in a single masking step without any surface cleaning of the niobium film. The current-voltage characteristic of these junctions do not show the knee structure which is generally attributed to a contamination or damaged layer on the niobium surface.

• Research Organization: State University of New York at Stony Brook, Stony Brook, NY
• OSTI ID: 6389111
• Report Number(s): CONF-840937-
• Conference Information: Journal Name: IEEE Trans. Magn.; (United States) Journal Volume: MAG-21:2
• Country of Publication: United States
• Language: English

Related Subjects

420201* -- Engineering-- Cryogenic Equipment & Devices
71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
ELEMENTS
ETCHING
FABRICATION
JUNCTIONS
LEAD
MASKING
METALS
NIOBIUM
SUPERCONDUCTING JUNCTIONS
SURFACE FINISHING
TRANSITION ELEMENTS