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Stabilization of tetragonal ZrO/sub 2/ with Al/sub 2/O/sub 3/ in reactive magnetron sputtered thin films

Journal Article · · J. Vac. Sci. Technol., A; (United States)
DOI:https://doi.org/10.1116/1.574925· OSTI ID:6370671

Thin-film mixtures of zirconia and alumina 1--2 ..mu..m in thickness were produced by sputtering composite targets of zirconium and aluminum metals and reacting the metal vapor with oxygen. X-ray and selected area electron diffraction indicated that the films deposited at room temperature were amorphous. Rutherford backscattering measurements indicated that the films were stoichiometric. Annealing at 1000/sup 0/C for 48 h produced ordering of the zirconia phase, and the zirconia crystal structure was strongly dependent upon the relative amounts of zirconium and aluminum. Pure zirconia was monoclinic as was a mixture with a zirconium-to-aluminum atom ratio of 0.76:0.24. For the mixture with a zirconium-to-aluminum atom ratio of 0.52:0.48 the tetragonal phase of zirconia was observed with only a trace of the monoclinic phase. The alumina phase apparently orders much more slowly than zirconia, and no alumina diffraction peaks were observed in any of these mixtures with zirconium-to-aluminum atom ratios down to 0.52:0.48.

Research Organization:
School of Engineering and Applied Sciences, George Washington University, Washington, DC 20052
OSTI ID:
6370671
Journal Information:
J. Vac. Sci. Technol., A; (United States), Journal Name: J. Vac. Sci. Technol., A; (United States) Vol. 5:4; ISSN JVTAD
Country of Publication:
United States
Language:
English