Ceramic coatings via PVD
Conference
·
· Ceram. Eng. Sci. Proc.; (United States)
OSTI ID:6360868
Physical vapor deposition (PVD) of ceramics has only recently reached commercial maturity. There are two main process categories: sputter-source PVD and evaporative-source PVD. Both methods have received their greatest development for the deposition of TiN. Both processes offer, in principle, the possibility to deposit a variety of alternative ceramic coatings. However, only the sputter source processes currently offer this commercial capability. Most PVD systems produce strongly oriented coatings, containing varying degrees of residual elastic stress, depending upon the coating/substrate composite body concerned. 59 references.
- OSTI ID:
- 6360868
- Report Number(s):
- CONF-880118-
- Journal Information:
- Ceram. Eng. Sci. Proc.; (United States), Journal Name: Ceram. Eng. Sci. Proc.; (United States) Vol. 9; ISSN CESPD
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
36 MATERIALS SCIENCE
360201* -- Ceramics
Cermets
& Refractories-- Preparation & Fabrication
CERAMICS
COATINGS
CRYSTALLOGRAPHY
DEPOSITION
NITRIDES
NITROGEN COMPOUNDS
PLASMA
PNICTIDES
RESIDUAL STRESSES
SPUTTERING
STRESSES
SUBSTRATES
TEMPERATURE EFFECTS
TITANIUM COMPOUNDS
TITANIUM NITRIDES
TRANSITION ELEMENT COMPOUNDS
360201* -- Ceramics
Cermets
& Refractories-- Preparation & Fabrication
CERAMICS
COATINGS
CRYSTALLOGRAPHY
DEPOSITION
NITRIDES
NITROGEN COMPOUNDS
PLASMA
PNICTIDES
RESIDUAL STRESSES
SPUTTERING
STRESSES
SUBSTRATES
TEMPERATURE EFFECTS
TITANIUM COMPOUNDS
TITANIUM NITRIDES
TRANSITION ELEMENT COMPOUNDS