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Title: Ceramic-metallic coatings by electron beam physical vapor deposition (EB-PVD) process

Conference ·
OSTI ID:387467
;  [1]
  1. Pennsylvania State Univ., State College, PA (United States)

Electron Beam Physical Vapor Deposition (EB-PVD) process is considered to be a technology that has overcome some of the difficulties or problems associated with the chemical vapor deposition (CVD), physical vapor deposition (PVD) and metal spray processes. The EB-PVD process offers many desirable characteristics such as relatively high deposition rates (up to 100-150 {mu}m/minute with an evaporation rate {approx}10-15 Kg/hour,) dense coatings, precise compositional control, columnar and poly-crystalline microstructure, low contamination, and high thermal efficiency. Various metallic and ceramic coatings (oxides, carbides, nitrides) can be deposited at relatively low temperatures. Even elements with low vapor pressure such as molybdenum, tungsten, and carbon are readily evaporated by this process. In addition, EB-PVD is capable of producing multi-layered laminated metallic/ceramic coatings on large components by changing the EB-PVD processing conditions such as ingot composition, part manipulation, and electron beam energy. Attachment of an ion assisted beam source to the EB-PVD offers additional benefits such as dense coatings with improved adhesion. In addition, textured coatings can be obtained that are desirable in many applications such as cutting tools. This laboratory has started a new thrust in the coating area by the EB-PVD process. The microstructure of thermal barrier ceramic coatings (i.e., yttria stabilized zirconia) developed by the EB-PVD process will be presented.

OSTI ID:
387467
Report Number(s):
CONF-951158-; TRN: 96:004973-0006
Resource Relation:
Conference: 12. annual conference on electron beam melting and refining: state of the art 1995, Reno, NV (United States), 11-13 Nov 1995; Other Information: PBD: 1995; Related Information: Is Part Of Electron beam melting and refining state of the art 1995; Bakish, R. [ed.]; PB: 299 p.
Country of Publication:
United States
Language:
English

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