Interface characterization of XUV multilayer reflectors using HRTEM (high-resolution transmission electron microscopy) and x-ray and XUV reflectance

Conference · Sun Jul 01 00:00:00 EDT 1990

OSTI ID:6360305

Windt, D L; Hull, R; Waskiewicz, W K; Kortright, J B

We have examined the structure of XUV multilayer coatings using high-resolution transmission electron microscopy (HRTEM). Using a variety of techniques, we have measured the interface widths and the interface topography from the digitized TEM images, and have compared these results to x-ray and XUV reflectance measurements. We find that the structural parameters measured from the TEM images and those deduced from reflectance are consistent in light of the probable systematic errors associated with the measurement and interpretation techniques. 14 refs., 12 figs., 1 tab.

• Research Organization: Lawrence Berkeley Lab., CA (USA)
• Sponsoring Organization: DOE/ER
• DOE Contract Number: AC03-76SF00098
• OSTI ID: 6360305
• Report Number(s): LBL-29618; CONF-900756-54; ON: DE91004411
• Resource Relation: Conference: SPIE's international symposium on optical and optoelectronic applied science and engineering exhibit, San Diego, CA (USA), 8-13 Jul 1990
• Country of Publication: United States
• Language: English

Related Subjects

75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
47 OTHER INSTRUMENTATION
REFLECTIVE COATINGS
TRANSMISSION ELECTRON MICROSCOPY
SURFACE COATING
INTERFACES
DIFFUSION
EXTREME ULTRAVIOLET RADIATION
THIN FILMS
TOPOGRAPHY
X-RAY DIFFRACTION
COATINGS
COHERENT SCATTERING
DEPOSITION
DIFFRACTION
ELECTROMAGNETIC RADIATION
ELECTRON MICROSCOPY
FILMS
MICROSCOPY
RADIATIONS
SCATTERING
ULTRAVIOLET RADIATION
656003* - Condensed Matter Physics- Interactions between Beams & Condensed Matter- (1987-)
440600 - Optical Instrumentation- (1990-)