Characterization of chemically amplified resists for soft x-ray projection lithography

Conference · · Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena; (United States)

OSTI ID:6347098

Kubiak, G D; Kneedler, E M; Hwang, R Q; Schulberg, M T; Berger, K W ^[1]; Bjorkholm, J E; Mansfield, W M ^[2]

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1. Sandia National Labs., Livermore, CA (United States)
2. AT T Bell Labs., Holmdel, NJ (United States)

Sensitivity, lithographic performance, photoabsorption, and photodesorption of chemically amplified novolac-based resists have been studied at an exposure wavelength of 140 [angstrom] and are compared to poly(methylmethacrylate) (PMMA). Monochromatic exposures of the resists AZ PF514, AZ PN114, and SAL 601 yielded D[sub 1.9] values of 2.5-3 mJ/cm[sup 2] for 0.25 [mu]m thick films. Contrast values ranged from 3 for AZ PN114 to 5 for SAL 601. Photoabsorption measurements of supported AZ PN114 films at 140 [angstrom] yield an absorption coefficient of 4.4[+-]0.1 [mu]m[sup [minus]1]. Photodesorption of fragment ions induced by 140[angstrom] radiation has been studied in PMMA and AZ PN114 using time-of-flight mass spectrometry. It is found that H[sup +], CH[sub 2][sup +], CH[sub 3][sup +], H[sub 2]O[sup +], CHO[sup +], C[sub 3]H[sub 5][sup +], and COOCH[sub 3+][sup +] dominate the ion mass spectra photodesorbed from PMMA, while H[sup +], CH[sub 3][sup +], H[sub 2]O[sup +], and CHO[sup +] dominate the ion mass spectra for AZ PN114. The mass-integrated ion desorption yield from AZ PN114 is three times less than that measured for PMMA per photon or 90 times less when expressed per exposure. Lithographic performance of AZ PF514 and SAL 601 has been characterized using a multilayer-coated 20X Schwarzschild objective and a transmissive Ge/Si mask illuminated by a laser plasma source. 19 refs., 8 figs.

• DOE Contract Number: AC04-76DP00789
• OSTI ID: 6347098
• Report Number(s): CONF-920575--
• Conference Information: Journal Name: Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena; (United States) Journal Volume: 10:6
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360606 -- Other Materials-- Physical Properties-- (1992-)
37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY
400500* -- Photochemistry
ABSORPTION
CHEMICAL PROPERTIES
CHEMISTRY
COATINGS
COMPARATIVE EVALUATIONS
DATA
DESORPTION
ELECTROMAGNETIC RADIATION
ESTERS
EVALUATION
EXPERIMENTAL DATA
FILMS
INFORMATION
IONIZING RADIATIONS
MASKING
MASS SPECTRA
NUMERICAL DATA
ORGANIC COMPOUNDS
ORGANIC POLYMERS
PHOTOCHEMISTRY
PHOTOSENSITIVITY
PMMA
POLYACRYLATES
POLYMERS
POLYVINYLS
RADIATIONS
SENSITIVITY
SORPTION
SPECTRA
SURFACES
X RADIATION