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U.S. Department of Energy
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Improvement of bulk and epitaxial III-V semiconductors for solar cells by creation of denuded recombination zones

Technical Report ·
OSTI ID:6343733
; ; ; ;  [1]
  1. Carnegie-Mellon Univ., Pittsburgh, PA (USA)
Increases in hole diffusion lengths of up to a factor of three were obtained in commercially grown liquid encapsulated Czochralski (Te-doped) and Si-doped horizontal Bridgman GaAs. This was achieved by application of a technique involving proximity annealing of the material in sealed silica ampoules. The short wavelength photoresponse of the cells was also enhanced. This was achieved by passivation of the surfaces of the cells with a simple chemical treatment using ammonium sulphide. Defect studies with deep level transient spectroscopy and photoluminescence revealed that the dominant recombination center in the material studied is a hole trap we have termed HCX (E{sub v}+0.29 eV). This is believed to be a native defect, perhaps associated with excess arsenic. Defect suppression was achieved in molecular beam epitaxial films by isoelectronic doping (with In and Sb). It was also shown that the defect structure in the films was affected by the choice of growth parameters such as growth rate and temperature.
Research Organization:
Solar Energy Research Inst., Golden, CO (USA); Carnegie-Mellon Univ., Pittsburgh, PA (USA)
Sponsoring Organization:
DOE/CE
DOE Contract Number:
AC02-83CH10093
OSTI ID:
6343733
Report Number(s):
SERI/TP-211-3990; ON: DE90000387
Country of Publication:
United States
Language:
English