Surface studies of amorphous W/sub 75/Si/sub 25/ oxidation
Journal Article
·
· J. Vac. Sci. Technol., A; (United States)
The surface composition and oxide growth kinetics of amorphous W/sub 75/Si/sub 25/ sputter-deposited thin films were examined using x-ray photoelectron spectroscopy (XPS), ellipsometry, and thermogravimetric analysis (TGA). These films have been proposed as metallization layers on compound semiconductors for high-temperature applications. The 1-..mu..m-thick films were oxidized in air at temperatures of 30 to 600 /sup 0/C for times of 10 min to 30 h. Angle resolved XPS measurements indicated that the surface region consisted of a thin layer (/similar to/16 A) of primarily SiO/sub 2/ above a layer of mainly WO/sub 3/ for oxidation temperatures up to 425 /sup 0/C. At oxidation temperatures between 150 and 425 /sup 0/C the WO/sub 3/ signal from the surface region was enhanced. In this range the SiO/sub 2/ layer was thinner resulting in a larger detected signal from the underlying WO/sub 3/ layer. For oxidation temperatures above 450 /sup 0/C, the two oxides appeared to coexist although the surface region was enhanced in SiO/sub 2/. Ellipsometry and TGA measurements did not indicate a change in oxide growth kinetics in the temperature range 150--550 /sup 0/C. The kinetics were parabolic and displayed an Arrhenius-type temperature dependence with rates similar to W oxidation.
- Research Organization:
- Sandia National Laboratories, Albuquerque, New Mexico 87185
- OSTI ID:
- 6338378
- Journal Information:
- J. Vac. Sci. Technol., A; (United States), Journal Name: J. Vac. Sci. Technol., A; (United States) Vol. 7:3; ISSN JVTAD
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
36 MATERIALS SCIENCE
360102* -- Metals & Alloys-- Structure & Phase Studies
ALLOY SYSTEMS
ALLOYS
AMORPHOUS STATE
BINARY ALLOY SYSTEMS
CHEMICAL COMPOSITION
CHEMICAL REACTIONS
COATINGS
COPPER
CRYSTAL GROWTH
CRYSTAL STRUCTURE
DATA
DEPOSITION
ELECTROMAGNETIC RADIATION
ELECTRON SPECTROSCOPY
ELEMENTS
EXPERIMENTAL DATA
FILMS
HIGH TEMPERATURE
INFORMATION
IONIZING RADIATIONS
METALS
NUMERICAL DATA
OXIDATION
PHOTOELECTRON SPECTROSCOPY
RADIATIONS
SILICON ALLOYS
SPECTROSCOPY
SPUTTERING
SURFACE PROPERTIES
THIN FILMS
TRANSITION ELEMENTS
TUNGSTEN ALLOYS
TUNGSTEN BASE ALLOYS
X RADIATION
360102* -- Metals & Alloys-- Structure & Phase Studies
ALLOY SYSTEMS
ALLOYS
AMORPHOUS STATE
BINARY ALLOY SYSTEMS
CHEMICAL COMPOSITION
CHEMICAL REACTIONS
COATINGS
COPPER
CRYSTAL GROWTH
CRYSTAL STRUCTURE
DATA
DEPOSITION
ELECTROMAGNETIC RADIATION
ELECTRON SPECTROSCOPY
ELEMENTS
EXPERIMENTAL DATA
FILMS
HIGH TEMPERATURE
INFORMATION
IONIZING RADIATIONS
METALS
NUMERICAL DATA
OXIDATION
PHOTOELECTRON SPECTROSCOPY
RADIATIONS
SILICON ALLOYS
SPECTROSCOPY
SPUTTERING
SURFACE PROPERTIES
THIN FILMS
TRANSITION ELEMENTS
TUNGSTEN ALLOYS
TUNGSTEN BASE ALLOYS
X RADIATION