Interactions of low energy reactive ions with surfaces. IV. Chemically bonded diamond-like films from ion-beam deposition
Journal Article
·
· J. Chem. Phys.; (United States)
Low energy (10--300 eV) mass-selected C/sup +/ ion beams are used to deposit thin carbon films on surfaces of Si(100), Ni(111), Ta, W, and Au in a UHV environment at room temperature. The films are characterized by Auger electron spectroscopy (AES), x-ray and UV photoelectron spectroscopy (XPS and UPS), valence level electron energy loss spectroscopy (ELS), K-shell ionization loss spectroscopy (ILS), and ellipsometry. The initial monolayer of the deposited film is in the form of a carbide layer which is chemically bonded to the substrate atoms. The film evolves gradually over the next several layers deposited, through intermediate structures, into a diamond-like structure. The diamond-like structure is confirmed by comparing the results of the above spectroscopic measurements with those of pure diamond and graphite and by referring to band structure calculations. A phase diagram, prepared as C/sup +/ ion dose vs C/sup +/ kinetic energy E/sub k/, shows the regions of the different structures. The optimum C/sup +/ energy range for formation of the diamond-like structure is 30--175 eV. Below 10 eV the final diamond-like structure has not been attained and above 180 eV there is a sharp increase in the dose required to attain this final structure. The films are found to be free of impurities, inert to O/sub 2/ chemisorption, structurally stable up to 350 /sup 0/C, have a low sputtering yield, and have a sharp interface with the substrate surface. The mechanism of film deposition and growth is discussed.
- Research Organization:
- Department of Chemistry, University of Houston, Houston, Texas 77004
- OSTI ID:
- 5372000
- Journal Information:
- J. Chem. Phys.; (United States), Journal Name: J. Chem. Phys.; (United States) Vol. 88:9; ISSN JCPSA
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY
400201 -- Chemical & Physicochemical Properties
656003* -- Condensed Matter Physics-- Interactions between Beams & Condensed Matter-- (1987-)
75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
AUGER ELECTRON SPECTROSCOPY
BEAMS
CARBON
CARBON IONS
CHARGED PARTICLES
COLLISIONS
CRYSTAL STRUCTURE
DEPOSITION
DIAMONDS
ELECTRON SPECTROSCOPY
ELEMENTAL MINERALS
ELEMENTS
ENERGY RANGE
EV RANGE
EV RANGE 10-100
EV RANGE 100-1000
FILMS
GOLD
ION BEAMS
ION COLLISIONS
IONS
METALS
MICROSTRUCTURE
MINERALS
NICKEL
NONMETALS
PHOTOELECTRON SPECTROSCOPY
SEMIMETALS
SILICON
SPECTROSCOPY
TANTALUM
THIN FILMS
TRANSITION ELEMENTS
TUNGSTEN
400201 -- Chemical & Physicochemical Properties
656003* -- Condensed Matter Physics-- Interactions between Beams & Condensed Matter-- (1987-)
75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
AUGER ELECTRON SPECTROSCOPY
BEAMS
CARBON
CARBON IONS
CHARGED PARTICLES
COLLISIONS
CRYSTAL STRUCTURE
DEPOSITION
DIAMONDS
ELECTRON SPECTROSCOPY
ELEMENTAL MINERALS
ELEMENTS
ENERGY RANGE
EV RANGE
EV RANGE 10-100
EV RANGE 100-1000
FILMS
GOLD
ION BEAMS
ION COLLISIONS
IONS
METALS
MICROSTRUCTURE
MINERALS
NICKEL
NONMETALS
PHOTOELECTRON SPECTROSCOPY
SEMIMETALS
SILICON
SPECTROSCOPY
TANTALUM
THIN FILMS
TRANSITION ELEMENTS
TUNGSTEN