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Heteroepitaxy of /sup 76/Ge films on GaAs by direct deposition from a low-energy ion beam

Journal Article · · J. Vac. Sci. Technol., A; (United States)
DOI:https://doi.org/10.1116/1.576288· OSTI ID:6336296
Germanium thin films have been deposited on GaAs substrates by direct deposition from a 40-eV /sup 76/ Ge/sup +/ ion beam. The effectiveness of in situ surface treatments and the relationship of deposition temperature to the quality of epitaxy have been examined. Single-crystal, epitaxially oriented Ge layers were grown at temperatures from 270 to 410 /sup 0/C. Ion channeling measurements on these layers showed excellent minimum yields. Transmission electron microscopy revealed a uniform distribution of small dislocation loops (diameter <10 nm) in the Ge film and a band of buried dislocation loops in the GaAs substrate. The defect characteristics were temperature dependent such that the average loop size in the epitaxial films decreased with temperature but the total damage density increased when the deposition temperature was lower than 410 /sup 0/C. Formation of these dislocation loops is ascribed to the coalescence of migrating interstitials which originate as low-energy recoils near the growing surface.
Research Organization:
Solid State Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831
OSTI ID:
6336296
Journal Information:
J. Vac. Sci. Technol., A; (United States), Journal Name: J. Vac. Sci. Technol., A; (United States) Vol. 7:3; ISSN JVTAD
Country of Publication:
United States
Language:
English