A laser beam photolithographic system for integrated optics applications: Ti-diffused LiNBO sub 3 directional couplers

Journal Article · Fri Sep 01 00:00:00 EDT 1989 · Applied Physics Communications; (USA)

OSTI ID:6330254

Andriani, P; Lepore, M ^[1]; De Pascale, O; Esposito, C ^[2]

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1. Universita di Bari (Italy)
2. Centro Laser, Valenzano/BA (Italy)

A computer-controlled laser system has been developed for writing photolithographic masks for integrated optics circuits over an area as large as 50 mm x 50 mm. The system has an autofocus mechanism which controls, in real time, the reciprocal distance between the focusing optics and the mask to be patterned. This system has been able to automatically write waveguide patterns, Y-junctions and directional couplers within an edge roughness of .2 {mu}m on photoresist-coated white-chrome masks. Furthermore, using some of these suitably modeled masks Ti:diffused LiNbO{sub 3} directional couplers have been fabricated.

• OSTI ID: 6330254
• Journal Information: Applied Physics Communications; (USA), Vol. 9:3; ISSN 0277-9374
• Country of Publication: United States
• Language: English

Related Subjects

42 ENGINEERING
INTEGRATED CIRCUITS
FABRICATION
EXPERIMENTAL DATA
LASERS
LITHIUM
MEASURING METHODS
NIOBIUM OXIDES
ALKALI METALS
CHALCOGENIDES
DATA
ELECTRONIC CIRCUITS
ELEMENTS
INFORMATION
METALS
MICROELECTRONIC CIRCUITS
NIOBIUM COMPOUNDS
NUMERICAL DATA
OXIDES
OXYGEN COMPOUNDS
REFRACTORY METAL COMPOUNDS
TRANSITION ELEMENT COMPOUNDS
426000* - Engineering- Components
Electron Devices & Circuits- (1990-)