Electron attachment rate constants of SO2 and CS2 in Ar, N2, and CH4 at varied E/N

Journal Article · Fri Feb 28 23:00:00 EST 1986 · J. Chem. Phys.; (United States)

DOI:https://doi.org/10.1063/1.450340· OSTI ID:6327705

Wang, W C; Lee, L C

The electron attachment rate constants of SO2 and CS2 in the buffer gases of Ar, N2, and CH4 (150 to 530 Torr) at various E/N (1--16 Td) were measured by a parallel-plate drift-tube electron-swarm technique. The electrons were produced by irradiating the cathode with KrF laser photons. For the SO2--Ar mixture, the electron attachment rate constant of SO2 increases with increasing E/N and is independent of Ar pressure. For SO2 in N2 and CH4, the electron attachment rates decrease with increasing E/N and increase with increasing buffer gas pressure. For CS2 in N2 and CH4, the electron attachment rates increase with increasing CS2 and buffer gas pressures and decrease with increasing E/N. The electron attachment to SO2 and CS2 in the buffer gases of N2 and CH4 is a three-body process. The collisional-stabilized rates of ''temporary'' negative compound ions SO/sup -asterisk/2 and CS/sup -asterisk/2 by various gases are investigated.

• Research Organization: Department of Electrical and Computer Engineering, San Diego State University, San Diego, California 92182
• OSTI ID: 6327705
• Journal Information: J. Chem. Phys.; (United States), Journal Name: J. Chem. Phys.; (United States) Vol. 84:5; ISSN JCPSA
• Country of Publication: United States
• Language: English

Related Subjects

640304* -- Atomic
Molecular & Chemical Physics-- Collision Phenomena
74 ATOMIC AND MOLECULAR PHYSICS
ALKANES
ARGON
CARBON COMPOUNDS
CARBON SULFIDES
CHALCOGENIDES
CHEMICAL REACTION KINETICS
COLLISIONS
ELECTRON ATTACHMENT
ELECTRON COLLISIONS
ELECTRON-MOLECULE COLLISIONS
ELEMENTS
FLUIDS
GASES
HYDROCARBONS
IONIZATION
KINETICS
METHANE
MOLECULE COLLISIONS
NITROGEN
NONMETALS
ORGANIC COMPOUNDS
OXIDES
OXYGEN COMPOUNDS
RARE GASES
REACTION KINETICS
SULFIDES
SULFUR COMPOUNDS
SULFUR DIOXIDE
SULFUR OXIDES