Metal carboxylate formation during indoor atmospheric corrosion of Cu, Zn, and Ni
Journal Article
·
· Journal of the Electrochemical Society
- Royal Inst. of Technology, Stockholm (Sweden)
Chemical analyses of surface films and corrosion products formed on pure Cu, Zn, Ni, and Ag samples exposed up to 12 months in various mild indoor environments have been performed by infrared reflection-absorption spectroscopy (IRAS) and X-ray photoelectron spectroscopy. The analyses reveal metal carboxylates to be the main ingredients on the surface of Cu, Zn, and Ni. Other ions, such as sulfate, chloride, nitrate, and ammonium ions are also present but in smaller amounts.The surface region on Ag contains mainly silver sulfide with smaller amounts of sulfate, ammonium, and chloride ions. The growth of the carboxylate layers, as followed by IRAS, exhibits an initial film formation with a thickness of a few nanometers for all exposure sites investigated. Subsequent growth to thicker layers was observed at sites with higher humidity levels. The unexpectedly high content of metal carboxylates found on Cu, Zn, and Ni may provide insight into possible processes involved in the atmospheric indoor corrosion of these metals.
- Sponsoring Organization:
- USDOE
- OSTI ID:
- 63188
- Journal Information:
- Journal of the Electrochemical Society, Journal Name: Journal of the Electrochemical Society Journal Issue: 5 Vol. 142; ISSN 0013-4651; ISSN JESOAN
- Country of Publication:
- United States
- Language:
- English
Similar Records
ATMOSPHERIC CORROSION BY ELECTROLYTE NUCLEI
Analysis of corrosion products formed on Cu-Ni alloys immersed in sea water
Theoretical model for two-layer metal-dielectric film growth
Journal Article
·
Sun Jul 01 00:00:00 EDT 1962
· J. Sci. Ind. Res. (India)
·
OSTI ID:4693495
Analysis of corrosion products formed on Cu-Ni alloys immersed in sea water
Journal Article
·
Mon Aug 01 00:00:00 EDT 1988
· Anal. Lett.; (United States)
·
OSTI ID:5995412
Theoretical model for two-layer metal-dielectric film growth
Journal Article
·
Wed Dec 31 23:00:00 EST 1980
· Appl. Phys. Commun.; (United States)
·
OSTI ID:6463910