Cylindrical magnetron co-sputter etching of copper with applications for solar selective absorbing surfaces

Journal Article · Wed Jul 01 04:00:00 EDT 1981 · J. Vac. Sci. Technol.; (United States)

DOI:https://doi.org/10.1116/1.571100· OSTI ID:6304246

Lake, M R; Harding, G L

Solar selective absorbing surfaces have been produced on large areas of copper plate seeded by a flux of titanium in a cylindical magnetron co-sputter etching system. Surface oxide on the copper and the introduction of reactive gas during the etching were necessary for production of reproducible textured surfaces. The variation of optical properties and surface morphology as a function of sputter etching conditions has been studied. Optimum selective surfaces have absorptance ..cap alpha..approx.0.92 and emittance epsilonapprox.0.18 at 300 K. Both absorptance and emittance decrease slightly after annealing for thousands of hours at 500 /sup 0/C in vacuum.

• Research Organization: School of Physics, University of Sydney, Sydney, NSW, 2006, Australia
• OSTI ID: 6304246
• Journal Information: J. Vac. Sci. Technol.; (United States), Journal Name: J. Vac. Sci. Technol.; (United States) Vol. 19:2; ISSN JVSTA
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360101* -- Metals & Alloys-- Preparation & Fabrication
COPPER
ELECTRON TUBES
ELECTRONIC EQUIPMENT
ELEMENTS
EQUIPMENT
ETCHING
MAGNETRONS
METALS
MICROWAVE EQUIPMENT
MICROWAVE TUBES
OPTICAL PROPERTIES
PHYSICAL PROPERTIES
RADIATIONS
SOLAR EQUIPMENT
SOLAR RADIATION
SPECTRALLY SELECTIVE SURFACES
STELLAR RADIATION
SURFACE FINISHING
SURFACE PROPERTIES
SURFACES
TITANIUM
TRANSITION ELEMENTS