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U.S. Department of Energy
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Fundamental studies of grain-boundary passivation in polycrystalline silicon with application to improved photovoltaic devices

Technical Report ·
OSTI ID:6302518

Theoretical studies of grain boundaries subject to uniform illumination have been completed. Barrier heights and recombination velocities for silicon grain boundaries have been calculated and are shown to be in good agreement with recently obtained transport measurements on uniformly illuminated silicon bicrystals. Improved calculations of the Hall effect in polycrystalline solids are also presented along with assessments of the ability of effective circuit models to account for the anomalously low carrier concentrations measured in small grain polycrystalline silicon. Preliminary optimization of some new methods for hydrogen passivation has been completed. Almost complete removal of EBIC grain boundary losses can now be achieved in times as short as twenty minutes. In addition, progress has been made in the identification and characterization of infrared vibrational modes associated with grain boundary-bonded hydrogen. The effects of fluorine and oxygen treatments on silicon grain boundaries have also been determined. These agents appear to increase grain boundary potential barrier heights in n-type silicon in marked contrast to the effect of hydrogen.

Research Organization:
Sandia National Labs., Albuquerque, NM (USA)
DOE Contract Number:
AC04-76DP00789
OSTI ID:
6302518
Report Number(s):
SAND-81-1950; ON: DE82000825
Country of Publication:
United States
Language:
English