Boron nitride thin film deposition using electron cyclotron resonance microwave plasmas
- Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831 (United States)
- Sandia National Laboratory, Albuquerque, New Mexico 87185 (United States)
Electron cyclotron resonance microwave plasma deposition has been used to deposit B[sub [ital x]]N[sub 1[minus][ital x]] thin films from borazine (B[sub 3]N[sub 3]H[sub 6])-based plasmas, including pure borazine and borazine mixed with either Kr or NH[sub 3]. Deposited films were analyzed using enhanced cross-section backscattering spectrometry, forward elastic recoil detection, x-ray diffraction, and infrared absorption. A wide range of stoichiometries was accessible even with pure borazine plasmas, with the ratio of B/N ranging from 0.54 to 4.4. The hydrogen atomic fraction varied from [similar to]1% to 20% and was typically 2%--3% for stoichiometric boron nitride (BN) films. No evidence of [ital c]-BN formation was observed, and measurements of the ion energy at which no net deposition occurs indicate that the high momentum transfer rates to the surface used for recent successful experiments on [ital c]-BN deposition are much more difficult to access with a borazine-plasma-based process. The mechanical properties of the films were measured using depth sensing ultralow load indentation tests, and the hardness and modulus of the films are reported. Finally, mass spectrometric measurements of the ions incident on the substrate indicate high hydrogen ion (H[sup +],H[sub 2][sup +], H[sub 3][sup +]) concentrations and a relatively small fraction of the boron and nitrogen in the deposited film coming from elemental ion precursors.
- DOE Contract Number:
- AC05-84OR21400; AC04-76DP00789
- OSTI ID:
- 6301884
- Journal Information:
- Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (United States), Journal Name: Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (United States) Vol. 11:4; ISSN 0734-2101; ISSN JVTAD6
- Country of Publication:
- United States
- Language:
- English
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BORON COMPOUNDS
BORON NITRIDES
CRYSTAL STRUCTURE
CYCLOTRON RESONANCE
DEPOSITION
ELECTRON CYCLOTRON-RESONANCE
FILMS
HARDNESS
MECHANICAL PROPERTIES
NITRIDES
NITROGEN COMPOUNDS
PLASMA
PNICTIDES
RESONANCE
STOICHIOMETRY
SURFACE COATING
THIN FILMS
VACUUM COATING