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In/Si(111)-[radical]3 [times] [radical]3 interface: An unrelaxed [ital T][sub 4] geometry

Journal Article · · Physical Review Letters; (United States)
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  1. National Institute of Standards and Technology, Gaithersburg, Maryland 20899 (United States) Stanford Electronics Laboratory, Stanford, California 94305 (United States) Department of Physics, Tulane University, New Orleans, Louisiana 70118 (United States) Argonne National Laboratory, Argonne, Illinois 60439 (United States)

Back reflection x-ray standing waves and surface extended x-ray absorption fine structure have determined the atomic coordinates (i.e., the perpendicular displacement [ital and] the near-neighbor bond lengths) at the In/Si(111)-[radical]3 [times] [radical]3 interface. Although the In adatoms are found to reside at a single position, 2.10[plus minus]0.06 A above the first Si bilayer, dual In-Si near-neighbor distances are found: 2.73[plus minus]0.02 A to the first- and 2.49[plus minus]0.03 A to the second-layer Si atoms, respectively. Contrary to the accepted model, our data suggest that the [ital T][sub 4] geometry is not relaxed.

DOE Contract Number:
AC03-82ER13000
OSTI ID:
6300423
Journal Information:
Physical Review Letters; (United States), Journal Name: Physical Review Letters; (United States) Vol. 71:8; ISSN 0031-9007; ISSN PRLTAO
Country of Publication:
United States
Language:
English