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2K nonvolatile shadow RAM and 265K EEPROM SONOS nonvolatile memory development

Conference ·
OSTI ID:629453
This paper describes Silicon Oxide Nitride Oxide Semiconductor (SONOS) nonvolatile memory development at Sandia National Laboratories. A 256K EEPROM nonvolatile memory and a 2K nonvolatile shadow RAM are under development using an n-channel SONOS memory technology. The technology has 1.2 {micro}m minimum features in a twin well design using shallow trench isolation.
Research Organization:
Sandia National Labs., Albuquerque, NM (United States)
Sponsoring Organization:
USDOE, Washington, DC (United States)
DOE Contract Number:
AC04-94AL85000
OSTI ID:
629453
Report Number(s):
SAND--98-1640C; CONF-980674--; ON: DE98003974
Country of Publication:
United States
Language:
English

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