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Strength of hot isostatically pressed and sintered reaction bonded silicon nitrides containing Y/sub 2/O/sub 3/

Technical Report ·
OSTI ID:6292296
The hot isostatic pressing of reaction bonded Si/sub 3/N/sub 4/ containing Y/sub 2/O/sub 3/ produced specimens with greater room temperature strengths than those by high pressure nitrogen sintering of the same material. Average room temperature bend strengths for hot isostatically pressed reaction bonded silicon nitride and high pressure nitrogen sintered reaction bonded silicon nitride were 767 and 670 MPa, respectively. Values of 472 and 495 MPa were observed at 1370 C. For specimens of similar but lower Y/sub 2/O/sub 3/ content produced from Si/sub 3/N/sub 4/ powder using the same high pressure nitrogen sintering conditions, the room temperature strength was 664 MPa and the 1370 C strength was 402 MPa. The greater strengths of the reaction bonded silicon nitride materials in comparison to the sintered silicon nitride powder material are attributed to the combined effect of processing method and higher Y/sub 2/O/sub 3/ content.
Research Organization:
National Aeronautics and Space Administration, Cleveland, OH (USA). Lewis Research Center
OSTI ID:
6292296
Report Number(s):
N-89-15257; NASA-TM-101443; E-4429; NAS-1.15:101443
Country of Publication:
United States
Language:
English