Negative charge emission due to excimer laser bombardment of sodium trisilicate glass

Journal Article · Mon Oct 15 00:00:00 EDT 1990 · Journal of Applied Physics; (USA)

DOI:https://doi.org/10.1063/1.346216· OSTI ID:6288737

Langford, S C; Jensen, L C; Dickinson, J T ^[1]; Pederson, L R ^[2]

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1. Physics Department, Washington State University, Pullman, WA (USA)
2. Pacific Northwest Laboratories, Richland, WA (USA)

We describe measurements of negative charge emission accompanying irradiation of sodium trisilicate glass (Na{sub 2}O{center dot}3SiO{sub 2}) with 248-nm excimer laser light at fluences on the order of 2 J/cm{sup 2} per pulse, i.e., at the threshold for ablative etching of the glass surface. The negative charge emission consists of a very prompt photoelectron burst coincident with the laser pulse, followed by a much slower plume of electrons and negative ions traveling with a high density cloud of positive ions, previously identified as primarily Na{sup +}. Using combinations of {bold E} and {bold B} fields in conjunction with time-of-flight methods, the negative ions were successfully separated from the plume and tentatively identified as O{sup {minus}}, Si{sup {minus}}, NaO{sup {minus}}, and perhaps NaSi{sup {minus}}. These negative species are probably formed by gas phase collisions in the near-surface region which result in electron attachment.

• OSTI ID: 6288737
• Journal Information: Journal of Applied Physics; (USA), Journal Name: Journal of Applied Physics; (USA) Journal Issue: 8 Vol. 68:8; ISSN 0021-8979; ISSN JAPIA
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360603* -- Materials-- Properties
ALKALI METAL COMPOUNDS
COLLISIONS
ELECTROMAGNETIC RADIATION
EXCIMER LASERS
GAS LASERS
GLASS
ION EMISSION
LASER RADIATION
LASERS
OXYGEN COMPOUNDS
PHOTON COLLISIONS
RADIATIONS
SILICATES
SILICON COMPOUNDS
SODIUM COMPOUNDS
SODIUM SILICATES
TIME-OF-FLIGHT METHOD