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The interaction of ultraviolet excimer laser light with sodium trisilicate

Journal Article · · Journal of Vacuum Science and Technology, A: Vacuum, Surfaces, and Films; (USA)
DOI:https://doi.org/10.1116/1.576172· OSTI ID:5504731
; ;  [1];  [2]
  1. Washington State University, Pullman, Washington 99164-2814 (US)
  2. Battelle Pacific Northwest Laboratories, Richland, Washington 99352

We describe the results of irradiating sodium trisilicate glass with 248-nm excimer laser light at fluences from 1 to 5 J/cm{sup 2}. A threshold for the onset of etching occurs at 3 J/cm{sup 2}. We investigate the changes in surface topography as a function of laser fluence. We also identify the ionic and neutral species contained in the emission plume. A clear correlation is observed between the etching threshold and (i) onset of emission of fast excited neutrals, as well as (ii) the appearance of atomic Na D resonance radiation. The high velocities (10--15 km/s) of the excited neutrals and ions (H{sup +}, Na{sup +}, and Si{sup +}) are attributed to laser/plume interactions. The character and origin of lower velocity neutral species (atomic O, Si and molecular NaO) are presented. The possible role of surface fracture in the onset of etching is also discussed.

OSTI ID:
5504731
Journal Information:
Journal of Vacuum Science and Technology, A: Vacuum, Surfaces, and Films; (USA), Journal Name: Journal of Vacuum Science and Technology, A: Vacuum, Surfaces, and Films; (USA) Vol. 7:5; ISSN 0734-2101; ISSN JVTAD
Country of Publication:
United States
Language:
English