Saddle-field ion source deposition of conductive thin films

Journal Article · Thu Jul 01 04:00:00 EDT 1993 · Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (United States)

DOI:https://doi.org/10.1116/1.578565· OSTI ID:6270224

Cardinale, G F; Howitt, D G ^[1]

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1. Department of Mechanical, Aeronautical, and Materials Engineering, University of California, Davis, California 95616 (United States)

Thin films of iridium and gold were deposited using the saddle-field source with argon as the sputtering gas. The purpose of this investigation was to determine the effects of deposition parameters on the grain size and composition of the films with thicknesses of 1.0, 2.5, and 5.0 nm, which are typical of the coatings used for high resolution electron microscopy. The films were deposited onto amorphous carbon films using ion beam sputtering, and as expected, the grain size of the films increased with the thickness, and the average grain size showed a dependence on the ion source energy. No oxides were formed in either the iridium or gold films.

• DOE Contract Number: FG03-86ER45279
• OSTI ID: 6270224
• Journal Information: Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (United States), Journal Name: Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (United States) Vol. 11:4; ISSN 0734-2101; ISSN JVTAD6
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360102* -- Metals & Alloys-- Structure & Phase Studies
ARGON IONS
BEAMS
CHARGED PARTICLES
DIMENSIONS
ELEMENTS
FILMS
GOLD
GRAIN SIZE
ION BEAMS
IONS
IRIDIUM
METALS
MICROSTRUCTURE
PLATINUM METALS
SIZE
SPUTTERING
THICKNESS
THIN FILMS
TRANSITION ELEMENTS