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Far-infrared measurements of Holstein processes and low-energy. cap alpha. /sup 2//sub tr/ F (. omega. ) structure in V/sub 3/Si

Journal Article · · Phys. Rev., B: Condens. Matter; (United States)
Far-infrared measurements in thin films of V/sub 3/Si at 19 K give evidence of Holstein processes. An analysis according to Allen's formulation yields a transport electron-phonon spectral function ..cap alpha../sup 2//sub tr/F (..omega..) which is enhanced at low energies relative to the phonon spectrum alone and exhibits a new peak at 6( +- 2) MeV. The enhancement and structure strongly influence calculated values of T/sub c/ and the electron-phonon parameter lambda/sub tr/ for V/sub 3/Si. The Holstein analysis resolves a large discrepancy between far-infrared and near-infrared values for the plasma frequency.
Research Organization:
Physics Department, Emory University, Atlanta, Georgia 30322
OSTI ID:
6260447
Journal Information:
Phys. Rev., B: Condens. Matter; (United States), Journal Name: Phys. Rev., B: Condens. Matter; (United States) Journal Issue: 11 Vol. 19:11; ISSN PRBMD
Country of Publication:
United States
Language:
English