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Reaction of amorphous NiNb films with crystalline metal overlayers

Conference ·
OSTI ID:6256244
In many cases the stability of amorphous films is influenced by interaction with metallic crystalline overlayers. Such interactions between Au, Ni, Nb and Ta overlayers and a-(Ni-Nb) films are reported. During interdiffusion Au overlayers reacted with a-(Ni-Nb) to form two different adjacent crystalline layers. In order to study the influence of realxation of the amorphous film on overlayer reaction several a-(Ni-Nb) samples were pre-annealed prior to Au deposition. High depth resolution Rutherford Backscattering Spectrometry (RBS) demonstrate that preannealing lowers the diffusion coefficient of Au in a-(Ni-Nb) at 450/sup 0/C from 7.5x10/sup -22/ m/sup 2//s to 8.7x10/sup -23/ m/sup 2//s. During interdiffusion Ta was discovered to be substantially more inert than Au. For example, negligible interdiffusion between Ta and a-(Ni-Nb) at 505/sup 0/C after 25 hours implies a diffusivity of less than 5x10/sup -24/ m/sup 2//s. These observations allow assessment of some of the requirements for increasing the stability of crystalline-amorphous metal film layered structures. 14 references, 4 figures.
Research Organization:
Wisconsin Univ., Madison (USA); Sandia National Labs., Albuquerque, NM (USA)
DOE Contract Number:
FG02-84ER45096; AC04-76DP00789
OSTI ID:
6256244
Report Number(s):
SAND-84-1292C; CONF-841157-53; ON: DE85005483
Country of Publication:
United States
Language:
English