2. 5 kHz high repetition rate XeCl excimer laser

Journal Article · Sat Dec 01 04:00:00 EST 1990 · Journal of Applied Physics; (USA)

DOI:https://doi.org/10.1063/1.346922· OSTI ID:6253766

Takagi, S; Okamoto, N; Kakizaki, K; Sato, S; Goto, T ^[1]

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1. Toshiba Corporation Manufacturing Engineering Laboratory, 8, Shinsugita-cho, Isogo-ku, Yokohama, 235, Japan (JP)

An XeCl excimer laser was operated at the high repetition rate of 2.5 kHz, which can circulate the laser gas uniformly and efficiently. The characteristics of the gas flow rate and the average laser power versus the repetition rate were investigated in both He and Ne buffer gas mixtures. In He buffer gas, the average laser power saturates at 1.3 kHz and, thereafter, drops abruptly. On the other hand, stable operation at the highest repetition rate, 2.5 kHz, has been attained in Ne buffer at a gas flow rate of 54 m/s with an average laser power of 87 W.

• OSTI ID: 6253766
• Journal Information: Journal of Applied Physics; (USA), Journal Name: Journal of Applied Physics; (USA) Vol. 68:11; ISSN 0021-8979; ISSN JAPIA
• Country of Publication: United States
• Language: English

Related Subjects

42 ENGINEERING
426002* -- Engineering-- Lasers & Masers-- (1990-)
BUFFERS
CHEMICAL COATING
CHEMICAL VAPOR DEPOSITION
CHLORIDES
CHLORINE COMPOUNDS
DEPOSITION
ELECTRIC DISCHARGES
ELEMENTS
ETCHING
EXCIMER LASERS
FLUIDS
FREQUENCY RANGE
GAS LASERS
GASES
HALIDES
HALOGEN COMPOUNDS
HELIUM
KHZ RANGE
KHZ RANGE 01-100
LASERS
NEON
NONMETALS
OPERATION
POWER
RARE GAS COMPOUNDS
RARE GASES
SURFACE COATING
SURFACE FINISHING
XENON CHLORIDES
XENON COMPOUNDS