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Effect of plasma sheath structure in plasma focus

Journal Article · · IEEE Transactions on Plasma Science (Institute of Electrical and Electronics Engineers); (United States)
DOI:https://doi.org/10.1109/27.221118· OSTI ID:6232155
The development of plasma sheath in the run-down phase and pinch phase in a plasma focus is studied with laser interferometry. The time-resolved interferograms show that the structures of plasma sheaths in the run-down phase are different at low and high pressures of filling gas. This leads to a distinct plasma pattern above the anode. At low pressure the plasma sheath in the run-down phase has clear boundaries, resulting in better compression in the pinch phase and a higher X-ray yield. At high pressure the plasma sheath is turbulent at the back side and becomes disordered in the pinch phase, giving little or no X-ray emission. The effect of a ceiling', i.e., a metal plate placed above the anode, is investigated. With the ceiling' the reproducibility of X-ray emission is much improved.
OSTI ID:
6232155
Journal Information:
IEEE Transactions on Plasma Science (Institute of Electrical and Electronics Engineers); (United States), Journal Name: IEEE Transactions on Plasma Science (Institute of Electrical and Electronics Engineers); (United States) Vol. 21:1; ISSN ITPSBD; ISSN 0093-3813
Country of Publication:
United States
Language:
English