Computer simulation of the self-sputtering of uranium

Journal Article · Sun May 01 04:00:00 EDT 1983 · J. Appl. Phys.; (United States)

DOI:https://doi.org/10.1063/1.332267· OSTI ID:6231436

Robinson, M T

The sputtering of polycrystalline ..cap alpha..-uranium by uranium ions of energies below 10 keV has been studied in the binary collision approximation using the computer simulation program marlowe. Satisfactory agreement of the computed sputtering yields with the small amount of available experimental data was achieved using the Moliere interatomic potential, a semilocal inelastic loss function, and a planar surface binding barrier, all with conventional parameters. The model is used to discuss low energy sputtering processes and the energy and angular distributions of the reflected primaries and the sputtered target particles.

• Research Organization: Solid State Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37830
• DOE Contract Number: W-7405-ENG-26
• OSTI ID: 6231436
• Journal Information: J. Appl. Phys.; (United States), Journal Name: J. Appl. Phys.; (United States) Vol. 54:5; ISSN JAPIA
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360105* -- Metals & Alloys-- Corrosion & Erosion
ACTINIDES
CHARGED PARTICLES
COMPUTER CODES
COMPUTERIZED SIMULATION
CRYSTALS
ELEMENTS
ENERGY RANGE
IONS
KEV RANGE
MATHEMATICAL MODELS
METALS
PARAMETRIC ANALYSIS
POLYCRYSTALS
POTENTIALS
SIMULATION
SPUTTERING
URANIUM
URANIUM IONS