Computer simulation of sputtering: A review

Conference · Sat Aug 01 04:00:00 EDT 1992

OSTI ID:10180125

Robinson, M T ^[1]; Hou, M ^[2]

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1. Oak Ridge National Lab., TN (United States)
2. Universite Libre de Bruxelles (Belgium)

In 1986, H. H. Andersen reviewed attempts to understand sputtering by computer simulation and identified several areas where further research was needed: potential energy functions for molecular dynamics (MD) modelling; the role of inelastic effects on sputtering, especially near the target surface; the modelling of surface binding in models based on the binary collision approximation (BCA); aspects of cluster emission in MD models; and angular distributions of sputtered particles. To these may be added kinetic energy distributions of sputtered particles and the relationships between MD and BCA models, as well as the development of intermediate models. Many of these topics are discussed. Recent advances in BCA modelling include the explicit evaluation of the time in strict BCA codes and the development of intermediate codes able to simulate certain many-particle problems realistically. Developments in MD modelling include the wide-spread use of many-body potentials in sputtering calculations, inclusion of realistic electron excitation and electron-phonon interactions, and several studies of cluster ion impacts on solid surfaces.

• Research Organization: Oak Ridge National Lab., TN (United States)
• Sponsoring Organization: USDOE, Washington, DC (United States)
• DOE Contract Number: AC05-84OR21400
• OSTI ID: 10180125
• Report Number(s): CONF-9208147--1; ON: DE92040888
• Country of Publication: United States
• Language: English

Related Subjects

665300
75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
99 GENERAL AND MISCELLANEOUS
990200
ANGULAR DISTRIBUTION
COMPUTERIZED SIMULATION
ELECTRON-PHONON COUPLING
ENERGY LOSSES
ENERGY SPECTRA
INTERACTIONS BETWEEN BEAMS AND CONDENSED MATTER
INTERATOMIC FORCES
ION COLLISIONS
MANY-BODY PROBLEM
MATHEMATICS AND COMPUTERS
PARALLEL PROCESSING
SPUTTERING
SURFACES