Skip to main content
U.S. Department of Energy
Office of Scientific and Technical Information

Semi-insulator-embedded InGaAsP/InP flat-surface buried heterostructure laser

Journal Article · · Appl. Phys. Lett.; (United States)
DOI:https://doi.org/10.1063/1.96350· OSTI ID:6211852
A new structure semi-insulator-embedded flat-surface buried heterostructure 1.3 ..mu..m InGaAsP/InP laser has been developed using chloride vapor phase epitaxy. cw threshold currents as low as 18 mA and high-temperature cw operation up to 100 /sup 0/C have been obtained. Small-signal response above 4 GHz has been achieved and no remarkable roll-off has been observed, which is due to small parasitic capacitance.
Research Organization:
Fujitsu Laboratories Ltd., 10-1 Morinosato-Wakamiya, Atsugi, 243-01, Japan
OSTI ID:
6211852
Journal Information:
Appl. Phys. Lett.; (United States), Journal Name: Appl. Phys. Lett.; (United States) Vol. 47:11; ISSN APPLA
Country of Publication:
United States
Language:
English