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Ion nitriding of titanium and zirconium by a dc-glow discharge method

Journal Article · · High Temp. Sci.; (United States)
OSTI ID:6190901
Nitrided surfaces of titanium and zirconium were prepared by operating a dc-glow discharge in a mixture of 20% N/sub 2/ and 80% H/sub 2/ at 20 to 40 Torr. The discharge was confined between a stainless steel anode and the sample at about 500 mA with a dc potential of 360 to 400 V. The temperature of the sample was about 900/sup 0/C. The kinetics of metal nitride formation are enhanced by about a factor of three in the dc discharge technique compared with either rf discharge or thermal nitriding methods. The golden-yellow nitrided surfaces were characterized by energy-dispersive x-ray and electron diffraction techniques. The results show that the nitrided surfaces contain mononitride phases. Depth-profile measurements were performed by argon-ion etching and surface analysis by means of XPS. The kinetics of the formation of surface nitride layers are discussed in terms of a reaction involving nitrogen--hydrogen molecular ions with the substrate. Diffusion of nitrogen into the bulk determines the rate of growth of the nitride layer.
Research Organization:
Argonne National Lab., IL
OSTI ID:
6190901
Journal Information:
High Temp. Sci.; (United States), Journal Name: High Temp. Sci.; (United States) Vol. 10; ISSN HITSA
Country of Publication:
United States
Language:
English