Photo-metalorganic molecular-beam epitaxy: A new epitaxial growth technique

Journal Article · Mon May 01 04:00:00 EDT 1989 · J. Vac. Sci. Technol., A; (United States)

DOI:https://doi.org/10.1116/1.575870· OSTI ID:6165543

Tokumitsu, E; Yamada, T; Konagai, M; Takahashi, K

Metalorganic molecular-beam epitaxy (MOMBE) combines many important advantages of molecular-beam epitaxy and metalorganic chemical vapor deposition. One of the most important features of MOMBE is that photochemical reaction can be used and we can call this new technique ''photo-MOMBE.'' Triisobutylaluminum (TIBA) has been used in photo-MOMBE instead of triethylaluminum (TEA) as a new aluminum source in order to enhance the photodecomposition. The optical absorption coefficient of TIBA for 193 nm was found to be three times greater than that of TEA. Selective deposition of Al, AlAs, and GaAlAs was carried out by using an ArF excimer laser. The Al mole fraction of GaAlAs ternary alloy grown with the excimer laser irradiation was greater than that of the film grown without the laser irradiation.

• Research Organization: Department of Electrical and Electronic Engineering, Tokyo Institute of Technology, O-okayama, Meguro-ku, Tokyo 152, Japan
• OSTI ID: 6165543
• Journal Information: J. Vac. Sci. Technol., A; (United States), Journal Name: J. Vac. Sci. Technol., A; (United States) Vol. 7:3; ISSN JVTAD
• Country of Publication: United States
• Language: English

Related Subjects

656003* -- Condensed Matter Physics-- Interactions between Beams & Condensed Matter-- (1987-)
75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
BEAMS
CHEMICAL COATING
CHEMICAL VAPOR DEPOSITION
CRYSTAL GROWTH METHODS
DEPOSITION
EPITAXY
FILMS
MOLECULAR BEAM EPITAXY
MOLECULAR BEAMS
ORGANIC COMPOUNDS
ORGANOMETALLIC COMPOUNDS
PERFORMANCE
SURFACE COATING
THIN FILMS
ULTRAHIGH VACUUM