Gas-phase reactions in plasmas of SF/sub 6/ with O/sub 2/ in He

Journal Article · Thu Sep 01 04:00:00 EDT 1988 · Plasma Chem. Plasma Process.; (United States)

DOI:https://doi.org/10.1007/BF01020406· OSTI ID:6159737

Ryan, K R; Plumb, I C

Processes which occur in microwave discharges of dilute mixtures of SF/sub 6/ and O/sub 2/ in He have been examined using a flow reactor sampled by a mass spectrometer. Two classes of experiments were performed. In the first set of experiments, mixtures containing 6 x 10/sup 11/ cm/sup -3/ SF/sub 6/, 6 x 10/sup 16/ cm/sup -3/ He, and O/sub 2/ in the range (0-3.6) x 10/sup 13/ cm/sup -3/ were passed through a 20-W 2450-MHz microwave discharge. The gas mixtures arriving at a sample point downstream from the discharge were examined for SF/sub 6/, SF/sub 4/, SOF/sub 2/, SOF/sub 4/, SO/sub 2/F/sub 2/, SO/sub 2/, F, and O. In the second class of experiments, rate coefficients were measured for the reactions of SF/sub 4/ with O and O/sub 2/ and for the reaction of SF with O. The rate coefficient for the reaction of SF with O was found to be (4.2 +/- 1.5) x 10/sup -11/ cm/sup -3/ s/sup -1/. SF/sup 4/ was found to react so slowly with both oxygen atoms and oxygen molecules that only upper limits could be placed on the rate coefficients for these reactions. These values were 2 x 10/sup -14/ cm/sup 3/ s/sup -1/ and 5 x 10/sup -15/ cm/sup 3/ s/sup -1/ for reactions with O and O/sub 2/ respectively. The observed distribution of products from the discharged mixtures is discussed in terms of the measured rate coefficients.

• Research Organization: CSIRO Div. of Applied Physics, Lindfield (Australia)
• OSTI ID: 6159737
• Journal Information: Plasma Chem. Plasma Process.; (United States), Journal Name: Plasma Chem. Plasma Process.; (United States) Vol. 8:3; ISSN PCPPD
• Country of Publication: United States
• Language: English

Related Subjects

37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY
400800* -- Combustion
Pyrolysis
& High-Temperature Chemistry
ATOMS
CHALCOGENIDES
CHARGED PARTICLES
CHEMICAL REACTION KINETICS
CHEMICAL REACTION YIELD
COLLISIONS
DISPERSIONS
DISSOCIATION
ELECTRIC DISCHARGES
ELECTRON COLLISIONS
ELEMENTS
ETCHING
FLUID FLOW
FLUIDS
FLUORIDES
FLUORINE
FLUORINE COMPOUNDS
GAS FLOW
GASES
HALIDES
HALOGEN COMPOUNDS
HALOGENS
HELIUM
HIGH-FREQUENCY DISCHARGES
IONIZATION
IONS
KINETICS
MASS SPECTROSCOPY
MIXTURES
MOLECULAR IONS
MOLECULES
NONMETALS
OXIDES
OXYFLUORIDES
OXYGEN
OXYGEN COMPOUNDS
PLASMA
QUANTITY RATIO
RARE GASES
REACTION KINETICS
SPECTROSCOPY
SULFUR COMPOUNDS
SULFUR DIOXIDE
SULFUR FLUORIDES
SULFUR OXIDES
SURFACE FINISHING
YIELDS