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XeF laser at a high electron beam pump rate

Journal Article · · Appl. Phys. Lett.; (United States)
DOI:https://doi.org/10.1063/1.98774· OSTI ID:6134098

A significant increase of the XeF laser efficiency has been observed in an electron beam pumped device. Mixtures of NF/sub 3/, Xe, and Ne at 300 K and a density of 3 amagat were pumped at a rate of 300 kW/cm/sup 3/ with a 500-ns pulse. This deposited 150 J/l into the laser cavity. Measurements were made for various mixtures and output couplings. The highest intrinsic laser efficiency (defined as the ratio of laser output energy to e-beam energy deposited into the gas) observed was 4.7%.

Research Organization:
Avco Research Laboratory, Inc., 2385 Revere Beach Parkway, Everett, Massachusetts 02149
OSTI ID:
6134098
Journal Information:
Appl. Phys. Lett.; (United States), Journal Name: Appl. Phys. Lett.; (United States) Vol. 51:13; ISSN APPLA
Country of Publication:
United States
Language:
English