Curcumin as a positive resist dye optimized for g- and h-line exposure

Journal Article · Mon Jun 01 04:00:00 EDT 1987 · J. Electrochem. Soc.; (United States)

DOI:https://doi.org/10.1149/1.2100716· OSTI ID:6115599

Renschler, C L; Stiefeld, R E; Rodriguez, J L

It has now been firmly established, both theoretically and experimentally, that the addition of a non-bleachable absorber (or dye) to photoresist can reduce notching and other linewidth control variations associated with the patterning of reflective surfaces. Such variations are due to two separate, but closely related, effects. The first of these effects is reflection of light off scattering centers on the substrate at angles other than surface-normal.

• Research Organization: Sandia National Labs., Albuquerque, NM 87185
• OSTI ID: 6115599
• Journal Information: J. Electrochem. Soc.; (United States), Journal Name: J. Electrochem. Soc.; (United States) Vol. 134:6; ISSN JESOA
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360603* -- Materials-- Properties
AROMATICS
CURCUMIN
DYES
ELECTRIC CONDUCTIVITY
ELECTRICAL EQUIPMENT
ELECTRICAL PROPERTIES
EQUIPMENT
ETHERS
HYDROXY COMPOUNDS
INCIDENCE ANGLE
KETONES
LINE WIDTHS
OPTICAL PROPERTIES
OPTIMIZATION
ORGANIC COMPOUNDS
ORGANIC OXYGEN COMPOUNDS
PHENOLS
PHOTOCONDUCTIVITY
PHOTORESISTORS
PHYSICAL PROPERTIES
POLYPHENOLS
REFLECTIVITY
RESISTORS
SUBSTRATES
SURFACE PROPERTIES
SURFACES