Phenolic dyes as nonbleachable absorbers compatible with novolac resins for linewidth control in photoresists
Patent
·
OSTI ID:6086684
Photoresist techniques and compositions are provided employing curcumin as an absorptive dye for the purpose of reducing linewidth non-uniformity caused by scattered and reflective light from the substrate-resist interface. The photoresist compositions containing curcumin as the absorptive dye are used in the production of microelectronic circuitry by both single layer and multilayer photoresist techniques.
- Research Organization:
- Sandia National Labs., Albuquerque, NM (USA)
- DOE Contract Number:
- AC04-76DP00789
- Assignee:
- Dept. of Energy
- Patent Number(s):
- None
- Application Number:
- ON: DE88000844
- OSTI ID:
- 6086684
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
36 MATERIALS SCIENCE
360601 -- Other Materials-- Preparation & Manufacture
360603 -- Materials-- Properties
42 ENGINEERING
420800* -- Engineering-- Electronic Circuits & Devices-- (-1989)
ABSORPTION
AROMATICS
BLEACHING
CONTROL
CURCUMIN
DEPOSITION
DYES
ELECTROMAGNETIC RADIATION
ETCHING
ETHERS
HYDROXY COMPOUNDS
KETONES
LAYERS
LIGHT SCATTERING
LINE WIDTHS
MICROELECTRONICS
ORGANIC COMPOUNDS
ORGANIC OXYGEN COMPOUNDS
ORGANIC POLYMERS
PETROCHEMICALS
PETROLEUM PRODUCTS
PHENOLS
PHOTOSENSITIVITY
POLYMERS
POLYPHENOLS
RADIATIONS
REFLECTION
RESINS
RESOLUTION
SCATTERING
SENSITIVITY
SPIN-ON COATING
SURFACE COATING
SURFACE FINISHING
ULTRAVIOLET RADIATION
360601 -- Other Materials-- Preparation & Manufacture
360603 -- Materials-- Properties
42 ENGINEERING
420800* -- Engineering-- Electronic Circuits & Devices-- (-1989)
ABSORPTION
AROMATICS
BLEACHING
CONTROL
CURCUMIN
DEPOSITION
DYES
ELECTROMAGNETIC RADIATION
ETCHING
ETHERS
HYDROXY COMPOUNDS
KETONES
LAYERS
LIGHT SCATTERING
LINE WIDTHS
MICROELECTRONICS
ORGANIC COMPOUNDS
ORGANIC OXYGEN COMPOUNDS
ORGANIC POLYMERS
PETROCHEMICALS
PETROLEUM PRODUCTS
PHENOLS
PHOTOSENSITIVITY
POLYMERS
POLYPHENOLS
RADIATIONS
REFLECTION
RESINS
RESOLUTION
SCATTERING
SENSITIVITY
SPIN-ON COATING
SURFACE COATING
SURFACE FINISHING
ULTRAVIOLET RADIATION