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Gallium arsenide films and solar cells on graphite substrates

Journal Article · · J. Appl. Phys.; (United States)
DOI:https://doi.org/10.1063/1.326723· OSTI ID:6113756

Gallium arsenide films have been deposited on graphite substrates by the reaction of gallium, hydrogen chloride, and arsine in a hydrogen flow. The structural and electrical properties of gallium arsenide films have been investigated. The interface between undoped gallium arsenide and graphite exhibits rectifying characteristics; however, a heavily doped interlayer reduces the interface resistance to a tolerable level. MOS-type solar cells prepared from n-GaAs/n/sup +/-GaAs/graphite structures have AM1 efficiencies of higher than 6%.

Research Organization:
Southern Methodist University, Dallas, Texas 75275
OSTI ID:
6113756
Journal Information:
J. Appl. Phys.; (United States), Journal Name: J. Appl. Phys.; (United States) Vol. 50:9; ISSN JAPIA
Country of Publication:
United States
Language:
English