Microstructural development in Si sub 3 N sub 4 /polysilazane bodies during heating

Journal Article · Fri Jul 01 00:00:00 EDT 1988 · Advanced Ceramic Materials; (USA)

DOI:https://doi.org/10.1111/j.1551-2916.1988.tb00226.x· OSTI ID:6108913

Schwartz, K B; Rowcliffe, D J; Blum, Y D ^[1]

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1. SRI International, Menlo Park, CA (USA)

The development of microstructure during heating has been investigated for molded Si{sub 3}N{sub 4} bodies fabricated with commercial {alpha}-Si{sub 3}N{sub 4} powder and a preceramic polysilazane binder. After the N-methyl polysilazane binder is pyrolyzed at 800{degree}C under N{sub 2}, the bodies have a uniform microstructure composed of an intimate mixture of Si{sub 3}N{sub 4} particles and polysilazane-derived amorphous silicon nitride. After the particles undergo high-temperature treatment at 1,725{degree}C in an N{sub 2} overpressure of {approx} 700 kPa, significant grain growth occurs. SEM and microhardness data suggest local densification in the body and high reactivity for the polysilazane-derived silicon nitride.

• OSTI ID: 6108913
• Journal Information: Advanced Ceramic Materials; (USA), Journal Name: Advanced Ceramic Materials; (USA) Vol. 3:4; ISSN 0883-5551; ISSN ACEME
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360201 -- Ceramics
Cermets
& Refractories-- Preparation & Fabrication
360202* -- Ceramics
Cermets
& Refractories-- Structure & Phase Studies
BINDERS
CRYSTAL STRUCTURE
DATA
EXPERIMENTAL DATA
FABRICATION
HIGH TEMPERATURE
INFORMATION
MEASURING INSTRUMENTS
MEASURING METHODS
MICROSTRUCTURE
NITRIDES
NITROGEN COMPOUNDS
NUMERICAL DATA
PNICTIDES
SILICON COMPOUNDS
SILICON NITRIDES