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Title: Oxidized Al[sub x]Ga[sub 1[minus]x]As heterostructure planar waveguides

Journal Article · · Applied Physics Letters
DOI:https://doi.org/10.1063/1.125236· OSTI ID:6105692
; ;  [1]; ;  [2]; ;  [3]
  1. Department of Electrical Engineering, University of Notre Dame, Notre Dame, Indiana 46556-5637 (United States)
  2. Metricon Corporation, P.O. Box 63, Pennington, New Jersey 08534 (United States)
  3. Sandia National Laboratory, P.O. Box 0603, Albuquerque, New Mexico 87185-0603 (United States)

Waveguiding by total internal reflection is demonstrated within Al[sub x]Ga[sub 1[minus]x]As semiconductor heterostructures which have been fully oxidized in water vapor at [approximately]490 hthinsp;[degree]C. Refractive index, mode propagation constant, propagation loss ([le]3 hthinsp;cm[sup [minus]1]) at [lambda][sub 0]=1.3 and 1.55 [mu]m, secondary ion mass spectrometry depth profile, and Fourier transform infrared transmission spectra measurements are presented to characterize a multimode single-heterostructure oxide waveguide. An index contrast of [Delta]n=0.06 is observed between oxidized x=0.4 and x=0.8 Al[sub x]Ga[sub 1[minus]x]As oxide layers. Absorption loss at 1.55 [mu]m is observed due to OH groups. Near-field images are presented showing waveguiding in a single-mode oxide double heterostructure. [copyright] [ital 1999 American Institute of Physics.]

OSTI ID:
6105692
Journal Information:
Applied Physics Letters, Vol. 75:20; ISSN 0003-6951
Country of Publication:
United States
Language:
English