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Experimental study of the minority-carrier transport at the polysilicon-monosilicon interface

Journal Article · · IEEE Trans. Electron Devices; (United States)
This paper presents the results of an experimental study to explore the mechanism of improved current gain in bipolar transistors with polysilicon emitter contacts. The electrical properties were measured using p-n junction test structures that are more sensitive to the contact properties than are bipolar transistors. A phenomenological model was used to correlate the structural properties with electrical measurements. Possible transport mechanisms are examined and estimates are made about upper bounds on transport parameters in the principal regions of the devices. The main conclusion is that the minority-carrier transport in the polycrystalline silicon is dominated by a highly disordered layer at the polysilicon-monosilicon interface characterized by very low minority-carrier mobility. The effective recombination velocity at the n/sup +/ polysilicon-n/sup +/ monosilicon interface was found to be a strong function of fabrication conditions. The results indicate that the recombination velocity can be much smaller than 10/sup 4/ cm/s.
Research Organization:
Department of Electrical Engineering, University of Florida, Gainesville, FL
OSTI ID:
6102939
Journal Information:
IEEE Trans. Electron Devices; (United States), Journal Name: IEEE Trans. Electron Devices; (United States) Vol. ED-32:4; ISSN IETDA
Country of Publication:
United States
Language:
English